HX6656KSRC [ETC]
32K x 8 ROM-SOI; 32K ×8 ROM - SOI
| 型号： | HX6656KSRC |
| 厂家： | 
ETC |
| 描述： | 32K x 8 ROM-SOI |
| 文件： | 总12页 (文件大小：154K) |
| 中文： | 中文翻译 | 下载： | 下载PDF数据表文档文件 |
Military & Space Products
32K x 8 ROM—SOI
HX6656
FEATURES
RADIATION
OTHER
•
Fabricated with RICMOS™ IV Silicon on Insulator
(SOI) 0.75 µm Process (Leff = 0.6 µm)
• Read Cycle Times
< 17 ns (Typical)
≤ 25 ns (-55 to 125°C)
•
•
Total Dose Hardness through 1x106 rad(SiO2)
• Typical Operating Power <15 mW/MHz
• Asynchronous Operation
Dynamic and Static Transient Upset
Hardness through 1x109 rad(Si)/s
•
•
•
•
Dose Rate Survivability through 1x1011 rad(Si)/s
Neutron Hardness through 1x1014 cm-2
SEU Immune
• CMOS or TTL Compatible I/O
• Single 5 V 10% Power Supply
• Packaging Options
- 28-Lead Flat Pack (0.500 in. x 0.720 in.)
- 28-Lead DIP, MIL-STD-1835, CDIP2-T28
- 36-Lead Flat Pack (0.630 in. x 0.650 in.)
Latchup Free
GENERAL DESCRIPTION
The 32K x 8 Radiation Hardened ROM is a high perform-
ance 32,768 word x 8-bit read only memory with industry-
standard functionality. It is fabricated with Honeywell’s
radiation hardened technology, and is designed for use in
systems operating in radiation environments. The ROM
operates over the full military temperature range and re-
quires only a single 5 V 10% power supply. The ROM is
available with either TTL or CMOS compatible I/O. Power
consumption is typically less than 15 mW/MHz in operation,
and less than 5 mW when de-selected. The ROM operation
is fully asynchronous, with an associated typical access
time of 14 ns.
Honeywell’s enhanced SOI RICMOS™ IV (Radiation Insen-
sitive CMOS) technology is radiation hardened through the
use of advanced and proprietary design, layout, and pro-
cess hardening techniques. The RICMOS™ IV process is a
5-volt, SIMOX CMOS technology with a 150 Å gate oxide
and a minimum drawn feature size of 0.75 µm (0.6 µm
effective gate length—Leff). Additional features include
tungsten via plugs, Honeywell’s proprietary SHARP pla-
narization process, and a lightly doped drain (LDD) struc-
ture for improved short channel reliability.
HX6656
FUNCTIONAL DIAGRAM
•
•
•
32,768 x 8
Memory
Array
A:0-8,12-13
Row
Decoder
11
CE
•
•
•
Q:0-7
Column Decoder
Data Output
NCS
8
1 = enab led
Signal
CS • CE • OE
(0 = high Z)
Signal
NOE
#
All controls must be
enab led for a signal to
pass. (#: number of
buffers, default = 1)
A:9-11,14
4
SIGNAL DEFINITIONS
A: 0-14
Q: 0-7
NCS
Address input pins which select a particular eight-bit word within the memory array.
Data Output Pins.
Negative chip select, when at a low level allows normal read operation. When at a high level NCS forces the
ROM to a precharge condition, holds the data output drivers in a high impedance state and disables all input
buffers except CE. If this signal is not used it must be connected to VSS.
NOE
CE*
Negative output enable, when at a high level holds the data output drivers in a high impedance state. When
at a low level, the data output driver state is defined by NCS and CE. If this signal is not used it must be
connected to VSS.
Chip enable, when at a high level allows normal operation. When at a low level CE forces the ROM to a
precharge condition, holds the data output drivers in a high impedance state and disables all the input buffers
except the NCS input buffer. If this signal is not used it must be connected to VDD.
TRUTH TABLE
NCS
CE*
NOE
MODE
Q
Notes:
L
H
X
H
X
L
L
Read
Data Out
High Z
X: VI=VIH or VIL
XX
XX
Deselected
Disabled
XX: VSS≤VI≤VDD
NOE=H: High Z output state maintained
for NCS=X, CE=X
High Z
*Not Available in 28-lead DIP or 28-Lead Flat Pack
2
HX6656
RADIATION CHARACTERISTICS
Total Ionizing Radiation Dose
The ROM will meet any functional or electrical specifica-
tion after exposure to a radiation pulse of ≤50 ns duration
up to 1x1011 rad(Si)/s, when applied under recommended
operating conditions.
The ROM will meet all stated functional and electrical
specifications over the entire operating temperature range
afterthespecifiedtotalionizingradiationdose. Allelectrical
and timing performance parameters will remain within
specifications after rebound at VDD = 5.5 V and T =125°C
extrapolatedtotenyearsofoperation. Totaldosehardness
isassuredbywaferleveltestingofprocessmonitortransis-
tors and ROM product using 10 keV X-ray and Co60
radiation sources. Transistor gate threshold shift correla-
tions have been made between 10 keV X-rays applied at a
dose rate of 1x105 rad(SiO2)/min at T = 25°C and gamma
rays (Cobalt 60 source) to ensure that wafer level X-ray
testing is consistent with standard military radiation test
environments.
Neutron Radiation
The ROM will meet any functional or timing specification
after a total neutron fluence of up to 1x1014 cm-2 applied
underrecommendedoperatingorstorageconditions.This
assumes an equivalent neutron energy of 1 MeV.
Single Event Phenomena
All storage elements within the ROM are immune to single
event upsets. No access time or other performance deg-
radation will occur for LET 190 MeV/cm/mg2.
Transient Pulse Ionizing Radiation
The ROM is capable of reading and retaining stored data
during and after exposure to a transient ionizing radiation
pulse of ≤1 µs duration up to 1x109 rad(Si)/s, when applied
under recommended operating conditions. To ensure va-
lidity of all specified performance parameters before, dur-
ing, and after radiation (timing degradation during tran-
sient pulse radiation (timing degradation during transient
pulse radiation is ≤10%), it is suggested that stiffening
capacitance be placed on or near the package VDD and
VSS, with a maximum inductance between the package
(chip) and stiffening capacitance of 0.7 nH per part. If
there are no operate-through requirements, typical circuit
board mounted de-coupling capacitors are recommended.
Latchup
TheROMwillnotlatchupduetoanyoftheaboveradiation
exposure conditions when applied under recommended
operating conditions. Fabrication with the SIMOX sub-
strate material provides oxide isolation between adjacent
PMOSandNMOStransistorsandeliminatesanypotential
SCR latchup structures. Sufficient transistor body tie con-
nections to the p- and n-channel substrates are made to
ensure no source/drain snapback occurs.
RADIATION HARDNESS RATINGS (1)
Limits (2)
Units
Test Conditions
Parameter
Total Dose
≥1x106
≥1x109
≥1x1011
≥1x1014
rad(SiO2)
rad(Si)/s
rad(Si)/s
N/cm2
TA=25°C
Pulse width ≤1 µs
Transient Dose Rate Upset (3)
Transient Dose Rate Survivability (3)
Neutron Fluence
Pulse width ≤50 ns, X-ray,
VDD=6.0 V, TA=25°C
1 MeV equivalent energy,
Unbiased, TA=25°C
(1) Device will not latch up due to any of the specified radiation exposure conditions.
(2) Operating conditions (unless otherwise specified): VDD=4.5 V to 5.5 V, TA=-55°C to 125°C.
(3) Not guaranteed with 28–Lead DIP.
3
HX6656
ABSOLUTE MAXIMUM RATINGS (1)
Rating
Units
Symbol
VDD
Parameter
Min
-0.5
-0.5
-65
Max
Positive Supply Voltage (2)
7.0
V
V
VPIN
Voltage on Any Pin (2)
VDD+0.5
150
TSTORE
TSOLDER
PD
Storage Temperature (Zero Bias)
Soldering Temperature • Time
Total Package Power Dissipation (3)
DC or Average Output Current
ESD Input Protection Voltage (4)
°C
°C•s
W
270•5
2.5
IOUT
25
mA
V
VPROT
2000
28 FP/36 FP
28 DIP
2
°C/W
°C
Thermal Resistance (Jct-to-Case)
Junction Temperature
ΘJC
10
TJ
175
(1) Stresses in excess of those listed above may result in permanent damage. These are stress ratings only, and operation at these levels is not
implied. Frequent or extended exposure to absolute maximum conditions may affect device reliability.
(2) Voltage referenced to VSS.
(3) ROM power dissipation (IDDSB + IDDOP) plus ROM output driver power dissipation due to external loading must not exceed this specification.
(4) Class 2 electrostatic discharge (ESD) input protection. Tested per MIL-STD-883, Method 3015 by DESC certified lab.
RECOMMENDED OPERATING CONDITIONS
Description
Units
Parameter
Symbol
Typ
5.0
25
Max
5.5
Min
4.5
VDD
TA
Supply Voltage (referenced to VSS)
Ambient Temperature
V
°C
V
-55
125
VPIN
Voltage on Any Pin (referenced to VSS)
-0.3
VDD+0.3
CAPACITANCE (1)
Worst Case
Typical
(1)
Test Conditions
Units
Symbol
Parameter
Min
Max
7
CI
Input Capacitance
pF
pF
VI=VDD or VSS, f=1 MHz
VIO=VDD or VSS, f=1 MHz
CO
Output Capacitance
9
(1) This parameter is tested during initial design characterization only.
4
HX6656
DC ELECTRICAL CHARACTERISTICS
Worst Case (2)
Typical
(1)
Symbol
Parameter
Units
Test Conditions
Min
Max
VIH=VDD IO=0
VIL=VSS Inputs Stable
IDDSB1
Static Supply Current
1.5
mA
mA
mA
µA
NCS=VDD, IO=0,
f=40 MHz
IDDSBMF Standby Supply Current - Deselected
1.5
4.0
+1
f=1 MHz, IO=0, CE=VIH=VDD
NCS=VIL=VSS
IDDOPR
II
Dynamic Supply Current, Selected
Input Leakage Current
VSS≤VI≤VDD
-1
-1
VSS≤VIO≤VDD
IOZ
Output Leakage Current
Low-Level Input Voltage
+1
µA
Output=high Z
VIL
CMOS
TTL
0.3xVDD
V
V
0.8
VDD = 4.5V
VDD = 5.5V
CMOS
TTL
0.7xVDD
V
V
VIH
High-Level Input Voltage
Low-Level Output Voltage
High-Level Output Voltage
2.2
0.4
0.05
V
V
VDD = 4.5V, IOL = 10 mA
VOL
VOH
VDD = 4.5V, IOL = 200 µA
4.2
VDD-0.05
V
V
VDD = 4.5V, IOH = -5 mA
VDD = 4.5V, IOH = -200 µA
(1) Typical operating conditions: VDD= 5.0 V,TA=25°C, pre-radiation.
(2) Worst case operating conditions: VDD=4.5 V to 5.5 V, -55°C to +125°C, post total dose at 25°C.
(3) All inputs switching. DC average current.
2.9 V
Valid high
output
+
-
Vref1
Vref2
249Ω
+
-
Valid low
output
DUT
output
C >50 pF*
L
*C = 5 pF for TWLQZ, TSHQZ, TELQZ, and TGHQZ
L
Tester Equivalent Load Circuit
5
HX6656
READ CYCLE AC TIMING CHARACTERISTICS (1)
Worst Case (3)
Symbol
Parameter
Typical
(2)
-55 to 125°C
Units
Min
Max
TAVAVR Address Read Cycle Time
25
ns
ns
ns
ns
ns
ns
ns
ns
ns
ns
ns
ns
TAVQV
TAXQX
TSLQV
TSLQX
TSHQZ
TEHQV
TEHQX
TELQZ
TGLQV
TGLQX
TGHQZ
Address Access Time
25
Address Change to Output Invalid Time
Chip Select Access Time
3
5
25
Chip Select Output Enable Time
Chip Select Output Disable Time
Chip Enable Access Time (4)
Chip Enable Output Enable Time (4)
Chip Enable Output Disable Time (4)
Output Enable Access Time
10
25
5
0
10
9
Output Enable Output Enable Time
Output Enable Output Disable Time
9
(1) Test conditions: input switching levels VIL/VIH=0.5V/VDD-0.5V (CMOS), VIL/VIH=0V/3V (TTL), input rise and fall times <1 ns/V, input and
output timing reference levels shown in the Tester AC Timing Characteristics table, capacitive output loading CL >50 pF, or equivalent
capacitive output loading CL=5 pF for TSHQZ, TELQZ TGHQZ. For CL >50 pF, derate access times by 0.02 ns/pF (typical).
(2) Typical operating conditions: VDD=5.0 V, TA=25°C, pre-radiation.
(3) Worst case operating conditions: VDD=4.5 V to 5.5 V, -55°C to +125°C, post total dose at 25°C.
(4) Chip Enable (CE) pin not available on 28-lead FP or DIP.
T
AVAVR
ADDRESS
NCS
T
AVQV
TAXQX
T
SLQV
T
SLQX
TSHQZ
HIGH
IMPEDANCE
DATA OUT
DATA VALID
T
EHQX
EHQV
T
TELQZ
CE
T
GLQX
GLQV
T
TGHQZ
NOE
6
HX6656
DYNAMIC ELECTRICAL CHARACTERISTICS
Read Cycle
The ROM is asynchronous in operation, allowing the read
cycletobecontrolledbyaddress,chipselect(NCS),orchip
enable (CE) (refer to Read Cycle timing diagram). To
perform a valid read operation, both chip select and output
enable (NOE) must be low and chip enable must be high.
The output drivers can be controlled independently by the
NOEsignal.Consecutivereadcyclescanbeexecutedwith
NCS held continuously low, and with CE held continuously
high, and toggling the addresses.
For an address activated read cycle, NCS and CE must be
valid prior to or coincident with the activating address edge
transition(s). Any amount of toggling or skew between
address edge transitions is permissible; however, data
outputs will become valid TAVQV time following the latest
occurring address edge transition. The minimum address
activated read cycle time is TAVAV. When the ROM is
operated at the minimum address activated read cycle
time, the data outputs will remain valid on the I/O until
TAXQX time following the next sequential address transi-
tion.
To control a read cycle with NCS, all addresses and CE
must be valid prior to or coincident with the enabling NCS
edge transition. Address or CE edge transitions can occur
later than the specified setup times to NCS, however, the
valid data access time will be delayed. Any address edge
transition, which occurs during the time when NCS is low,
will initiate a new read access, and data outputs will not
becomevaliduntilTAVQVtimefollowingtheaddressedge
transition. Data outputs will enter a high impedance state
TSHQZ time following a disabling NCS edge transition.
To control a read cycle with CE, all addresses and NCS
must be valid prior to or coincident with the enabling CE
edge transition. Address or NCS edge transitions can
occur later than the specified setup times to CE; however,
the valid data access time will be delayed. Any address
edge transition which occurs during the time when CE is
high will initiate a new read access, and data outputs will
not become valid until TAVQV time following the address
edge transition. Data outputs will enter a high impedance
state TELQZ time following a disabling CE edge transition.
7
HX6656
TESTER AC TIMING CHARACTERISTICS
TTL I/O Configuration
CMOS I/O Configuration
3 V
0 V
VDD-0.5 V
Input
Levels*
1.5 V
VDD/2
0.5 V
1.5 V
VDD/2
Output
Sense
Levels
VDD-0.4V
0.4 V
VDD-0.4V
High Z
High Z
0.4 V
3.4 V
2.4 V
3.4 V
2.4 V
High Z
High Z
High Z = 2.9V
High Z = 2.9V
* Input rise and fall times <1 ns/V
QUALITY AND RADIATION HARDNESS
ASSURANCE
Honeywellmaintainsahighlevelofproductintegritythrough
process control, utilizing statistical process control, a com-
plete “Total Quality Assurance System,” a computer data
base process performance tracking system, and a radia-
tion-hardness assurance strategy.
need to create detailed specifications and offer benefits of
improved quality and cost savings through standardization.
RELIABILITY
The radiation hardness assurance strategy starts with a
technology that is resistant to the effects of radiation.
Radiationhardnessisassuredoneverywaferbyirradiating
test structures as well as product die, and then monitoring
key parameters which are sensitive to ionizing radiation.
Conventional MIL-STD-883C TM 5005 Group E testing,
which includes total dose exposure with Cobalt 60, may
alsobeperformedasrequired. ThisTotalQualityapproach
ensures our customers of a reliable product by engineering
in reliability, starting with process development and con-
tinuing through product qualification and screening.
Honeywell understands the stringent reliability require-
ments for space and defense systems and has extensive
experience in reliability testing on programs of this nature.
This experience is derived from comprehensive testing of
VLSI processes. Reliability attributes of the RICMOSTM
process were characterized by testing specially designed
irradiated and non-irradiated test structures from which
specificfailuremechanismswereevaluated.Thesespecific
mechanisms included, but were not limited to, hot carriers,
electromigration and time dependent dielectric breakdown.
This data was then used to make changes to the design
models and process to ensure more reliable products.
SCREENING LEVELS
In addition, the reliability of the RICMOSTM process and
product in a military environment was monitored by testing
irradiated and non-irradiated circuits in accelerated dy-
namic life test conditions. Packages are qualified for prod-
uct use after undergoing Groups B & D testing as outlined
in MIL-STD-883, TM 5005, Class S. The product is qualified
by following a screening and testing flow to meet the
customer’s requirements. Quality conformance testing is
performed as an option on all production lots to ensure the
ongoing reliability of the product.
Honeywell offers several levels of device screening to meet
your system needs. “Engineering Devices” are available
with limited performance and screening for breadboarding
and/or evaluation testing. Hi-Rel Level B and S devices
undergo additional screening per the requirements of MIL-
STD-883. As a QML supplier, Honeywell also offers QML
Class Q and V devices per MIL-PRF-38535 and are avail-
able per the applicable Standard Military Drawing (SMD).
QML devices offer ease of procurement by eliminating the
8
HX6656
PACKAGING
Ceramic chip capacitors can be mounted to the package to
maximize supply noise decoupling and increase board
packing density. These capacitors attach directly to the
internal package power and ground planes. This design
minimizes resistance and inductance of the bond wire and
package. All NC (no connect) pins should be connected
to VSS to prevent charge build up in the radiation
environment.
The 32K x 8 ROM is offered in a custom 36-lead flat pack
(FP), 28-Lead FP, or standard 28-lead DIP. Each package
is constructed of multilayer ceramic (Al2O3) and features
internal power and ground planes. The 36-lead FP also
features a non-conductive ceramic tie bar on the lead
frame. The tie bar allows electrical testing of the device,
while preserving the lead integrity during shipping and
handling, up to the point of lead forming and insertion.
28-LEAD FP PINOUT
36-LEAD FP PINOUT
A14
A12
A7
A6
A5
A4
A3
A2
A1
1
28
27
26
25
24
23
22
21
20
19
18
17
16
15
VDD
NWE
A13
A8
VSS
VDD
A14
A12
A7
1
36
35
34
33
32
31
30
29
28
27
26
25
24
23
22
21
20
19
VSS
VDD
NWE
CE
2
2
3
3
4
4
5
A13
A8
A6
6
5
A9
A5
7
A9
6
A11
NOE
A10
NCS
DQ7
DQ6
DQ5
DQ4
DQ3
A4
8
A11
NOE
A10
NCS
DQ7
DQ6
DQ5
DQ4
DQ3
VDD
VSS
Top
View
A3
9
Top
View
7
A2
10
11
12
13
14
15
16
17
18
8
A1
A0
9
DQ0
DQ1
DQ2
NC
A0
10
11
12
13
14
DQ0
DQ1
DQ2
VSS
VDD
VSS
36-LEAD FLAT PACK
E
22018131-001
1
b
(width)
Top
View
e
(pitch)
H
L
L
Non-
Conductive
Tie-Bar
Ceramic
Body
Kovar
Lid [3]
A
J
0.004
C
M
S
N
I
X
Optional
Capacitors
VDD
All dimensions are in inches [1]
VSS
VSS
VDD
A
b
C
D
E
e
F
G
H
I
0.095 ± 0.014
0.008 ± 0.002
0.005 to 0.0075
0.650 ± 0.010
0.630 ± 0.007
0.025 ± 0.002 [2]
0.425 ± 0.005 [2]
0.525 ± 0.005
0.135 ± 0.005
0.030 ± 0.005
0.080 typ.
M
N
O
P
R
S
T
U
V
W
X
Y
0.008 ± 0.003
0.050 ± 0.010
0.090 ref
0.015 ref
0.075 ref
0.113 ± 0.010
0.050 ref
0.030 ref
0.080 ref
0.005 ref
Y
J
L
0.450 ref
0.400 ref
0.285 ± 0.015
1
1
[1] Parts delivered with leads unformed
[2] At tie bar
[3] Lid tied to VSS
O
V
W
T
P
U
R
9
HX6656
28-LEAD FLAT PACK (22017842-001)
E
Index
All dimensions in inches
1
1
A
b
C
D
e
0.105 0.015
0.017 0.002
0.003 to 0.006
0.720 0.008
0.050 0.005 [1]
0.500 0.007
b
(width)
TOP
VIEW
E
BOTTOM
VIEW
e
E2 0.380 0.008
E3 0.060 ref
F
G
L
Q
S
(pitch)
0.650 0.005 [2]
0.035 0.004
0.295 min [3]
0.026 to 0.045
0.045 0.010
0.130 ref
S
U
L
U
W
X
W
A
Capacitor
Pads
0.050 ref
X
0.075 ref
Y
Y
0.010 ref
[1] BSC – Basic lead spacing between centers
[2] Where lead is brazed to package
[3] Parts delivered with leads unformed
[4] Lid connected to VSS
Kovar
Lid [4]
Ceramic
Body
Lead
Alloy 42 [3]
C
Q
G
E3
E2
28-LEAD DIP (22017785-001)
For 28-Lead DIP description, see MIL-STD-1835, Type CDIP2-T28, Config. C, Dimensions D-10
10
HX6656
STATIC BURN-IN DIAGRAM*
DYNAMIC BURN-IN DIAGRAM*
VDD
VDD
VDD
28
27
26
25
24
23
22
21
20
19
18
17
16
15
1
2
1
2
28
27
26
25
24
23
22
21
20
19
18
17
16
15
A14
A12
A7
A6
A5
A4
A3
A2
A1
VDD
NC
A13
A8
A14
A12
A7
A6
A5
A4
A3
A2
A1
VDD
NC
A13
A8
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
R
F16
F7
F6
F5
F4
F3
F2
F8
F13
F14
F1
F1
F1
R
R
R
R
R
R
R
R
R
R
R
R
R
F0
3
3
F15
F12
F11
F10
F17
F9
F17
F1
F1
4
4
5
5
A9
A9
6
6
A11
NOE
A10
NCS
DQ7
DQ6
DQ5
DQ4
DQ3
A11
NOE
A10
NCS
DQ7
DQ6
DQ5
DQ4
DQ3
7
7
8
8
9
9
10
11
12
13
14
10
11
12
13
14
A0
A0
DQ0
DQ1
DQ2
VSS
DQ0
DQ1
DQ2
VSS
F1
F1
F1
VSS
VSS
VDD = 6.5V, R ≤ 10 KΩ, VIH = VDD, VIL = VSS
Ambient Temperature ≥ 125 °C, F0 ≥ 100 KHz Sq Wave
Frequency of F1 = F0/2, F2 = F0/4, F3 = F0/8, etc.
VDD = 5.5V, R ≤ 10 KΩ
Ambient Temperature ≥ 125 °C
*36-lead Flat Pack burn-in diagrams have similar connections and are available on request.
ROM CODE
The ROM code can be provided to Honeywell via FTP, E-Mail or a variety of magnetic storage media, including
3.5 inch floppy disc, 4m digital tape and others.
The ROM Code data file should contain the following format:
<address> [/] <data> [;] [Comment]
Where items enclosed in ‘[‘and’]’ are optional.
The address and data must be hex numbers in the form, MSB...LSB. The “/” and the “;” are optional and any
characters after the “#” are comments. For example the following input file, all of the lines are valid:
000 d4
001 / 32
002 1d
003 / 72;
4/5e; # all of these lines are in valid format
11
HX6656
ORDERING INFORMATION (1)
6656
H
H
X
N
S
C
SCREEN LEVEL
V=QML Class V
Q=QML Class Q
S=Level S
PART NUMBER
INPUT
BUFFER TYPE
C=CMOS Level
T=TTL Level
PROCESS
PACKAGE DESIGNATION
N=28-Lead FP
B=Level B
E=Engr Device (2)
TOTAL DOSE
HARDNESS
X=SOI
R=28-Lead DIP
X=36-Lead FP
K=Known Good Die
- = Bare die (No Package)
R=1x105 rad(SiO2)
F=3x105 rad(SiO2)
H=1x106 rad(SiO2)
SOURCE
H=HONEYWELL
N=No Level Guaranteed
(1) Orders may be faxed to 612-954-2051. Please contact our Customer Logistics Department at 612-954-2888 for further information.
(2) Engineering Device description: Parameters are tested from -55 to 125°C, 24 hr burn-in, no radiation guaranteed.
Contact Factory with other needs.
To lea r n m or e a bou t Hon eyw ell Solid Sta te Electr on ics Cen ter ,
visit ou r w eb site a t h ttp ://w w w .ssec.h on eyw ell.com
Honeywell reserves the right to make changes to any products or technology herein to improve reliability, function or design. Honeywell does not assume any liability
arising out of the application or use of any product or circuit described herein; neither does it convey any license under its patent rights nor the rights of others.
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