P231-EC35BR100K [ETC]

24mm Rotary Potentiometer Carbon Element Metal shaft / Bushing RoHS Compliant; 24毫米旋转电位碳元素金属轴/轴承符合RoHS
P231-EC35BR100K
型号: P231-EC35BR100K
厂家: ETC    ETC
描述:

24mm Rotary Potentiometer Carbon Element Metal shaft / Bushing RoHS Compliant
24毫米旋转电位碳元素金属轴/轴承符合RoHS

文件: 总3页 (文件大小:306K)
中文:  中文翻译
下载:  下载PDF数据表文档文件
Model P231  
24mm Rotary Potentiometer  
Carbon Element  
Metal shaft / Bushing  
RoHS Compliant  
MODEL STYLE  
Side Adjust , Solder Lugs  
P231  
ELECTRICAL1  
Resistance Range, Ohms  
Standard Resistance Tolerance  
Residual Resistance  
500-1M  
20%  
20 ohms max.  
Input Voltage, maximum  
Power rating, Watts  
500 Vac max.  
0.5W- B taper, 0.25W-others  
500Vac, I minute  
100M ohms at 250Vdc  
100mV max.  
Dielectric Strength  
Insulation Resistance, Minimum  
Sliding Noise  
Actual Electrical Travel, Nominal  
270°  
MECHANICAL  
Total Mechanical Travel  
Static Stop Strength  
300° 10°  
70 oz-in  
Rotational Torque, Maximum  
2.5 oz-in  
ENVIRONMENTAL  
Operating Temperature Range  
Rotational Life  
-20°C to +70°C  
10,000 cycles  
1
Specifications subject to change without notice.  
BI Technologies Corporation  
4200 Bonita Place, Fullerton, CA 92835 USA  
Phone: 714 447 2345 Website: www.bitechnologies.com  
BI technologies  
October 26, 2006  
page 1 of 3  
Model P231  
ORDERING INFORMATION2  
P231 - F C 20 B R100K  
Total Resistance  
Tapers A, B, C  
Model Series  
Shaft Length “L” see below  
Shaft Type  
Full CCW Shaft Position: see below  
Shaft Types  
Shaft Position  
STANDARD RESISTANCE VALUES, OHMS  
500  
1K  
2K  
5K  
10K  
20K  
50K  
100K  
200K  
500K  
1MEG  
2
Contact our customer service for custom designs and features.  
BI Technologies Corporation  
4200 Bonita Place, Fullerton, CA 92835 USA  
Phone: 714 447 2345 Website: www.bitechnologies.com  
BI technologies  
October 26, 2006  
page 2 of 3  
Model P231  
OUTLINE DRAWING  
CIRCUIT DIAGRAM  
BI Technologies Corporation  
4200 Bonita Place, Fullerton, CA 92835 USA  
Phone: 714 447 2345 Website: www.bitechnologies.com  
BI technologies  
October 26, 2006  
page 3 of 3  

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