PE3 [TE]

GaAs Foundry Services PROCESS PE3; 砷化镓晶圆代工服务流程PE3
PE3
型号: PE3
厂家: TE CONNECTIVITY    TE CONNECTIVITY
描述:

GaAs Foundry Services PROCESS PE3
砷化镓晶圆代工服务流程PE3

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GaAs Foundry Services  
PROCESS PE3  
Features  
PE3  
V2.00  
Typical RF Performance  
FC06 (6X150) 900 um FET  
0.5 µm MBE MESFET Technology for High Power  
Applications  
MMICs up to 18 GHz  
100 mm wafer diameter  
Layout and design assistance  
Space qualification  
Param.  
MAG  
PSAT  
PAE  
ft  
Test Conditions  
Freq.  
2/12GHz  
2/12GHz  
2/12GHz  
------  
Typ. Val.  
22/13.5dB  
680/525mW/mm  
50/41%  
VDS = 8V, IDS = .40IDSS  
VDS = 8V, IDS = .40IDSS  
VDS = 8V, IDS = .40IDSS  
VDS = 8V, IDS = .40IDSS  
Custom test and packaging  
20GHz  
Description  
Ordering Information  
M/A-COM’s PE3 process utilizes molecular beam epitaxy (MBE) to  
implement a MESFET active layer structure that achieves high  
efficiency and breakdown for multi-watt power applications thru  
18GHz. The focus is on products for moderate to high volume  
Part Number  
FE43-0001  
SVC6310  
Description  
PE3 Wafer  
Mask Set  
applications.  
M/A-COM offers a full compliment of foundry  
services to meet the requirements for custom designing a MMIC-  
based die or packaged product.  
Electrical Specifications: TA = +25 °C  
Parameter  
200um PCM FET  
IDSS  
Test Conditions  
Units  
Min.  
Typ.  
Max.  
VDS = 3V, VGS = 0V  
mA/mm  
mS/mm  
V
180  
125  
-1.2  
-11  
240  
150  
-1.8  
-15  
310  
185  
-2.2  
-
DC GM  
VDS = 3V, IDS = 0.5IDSS  
VDS = 3V, IDS = 0.025IDSS  
IG = 0.1mA/mm  
Vp  
BVgd  
V
RF GM  
VDS = 3V, IDS = 0.5IDSS  
VDS = 3V, IDS = 0.5IDSS  
VDS = 3V, IDS = 0.5IDSS  
VDS = 3V, IDS = 0.5IDSS  
VDS = 3V, IDS = 0.5IDSS  
mS  
25  
32  
45  
Cgs  
pF  
.140  
.015  
.025  
20  
.200  
.022  
.038  
26  
.280  
.028  
.050  
34  
Cgd  
pF  
Cds  
pF  
Ft  
GHz  
Sheet Resistances  
NDRS (N- GaAs)  
NCRS (NiCr)  
GFRS (Gate Metal)  
MIM Capacitors  
Capacitance/unit area  
Capacitor Leakage  
l = 20mA  
l = 10mA  
l = 20mA  
Ohms/sq  
Ohms/sq  
Ohms/sq  
340  
42  
-
375  
50  
410  
58  
.027  
.040  
f = 1MHz  
V = 10V  
pF/mm2  
360  
-
400  
-
440  
0.5  
µA  
Specifications Subject to Change Without Notice.  
M/A-COM Inc.  
1
North America: Tel. (800) 366-2266  
Fax (800) 618-8883  
Asia/Pacific: Tel. +81 3 3263-8761  
Fax +81 3 3263-8769  
Europe:  
Tel. +44 (1344) 869-595  
Fax +44 (1344) 300-020  
GaAs Foundry Services  
Process PE3  
V2.00  
Normalized Nominal Models  
Mask Layer Assignments  
Parameter  
25% IDSS 8 VDS  
62.62  
50% IDSS 8 VDS  
127.96  
155.44  
1.303  
LAYER  
PROCESS  
CODE  
OH  
PROCESS  
DESCRIPTION  
Ohmic  
IDS mA/mm  
gm mS/mm  
Cgs pF/mm  
Cgd pF/mm  
Cds pF/mm  
Td pS  
3
4
140.37  
1.178  
BI  
Boron Isolation  
Resistor Deposition  
Gate Finger  
Gate Interconnect  
Top via  
5
RD  
0.072  
0.059  
7
GF  
0.172  
0.185  
8
GL  
5.574  
5.502  
10  
11  
12  
13  
25  
28  
29  
TV  
Ri Ohms-mm  
Gds mS/mm  
Ggs mS/mm  
Rg Ohms/mm  
Rs Ohms-mm  
Rd Ohms-mm  
Lg nH/Finger  
Ld nH/Finger  
Cgp pF/mm  
Cdp pF/mm  
2.093  
1.729  
OL  
Overlay  
9.214  
7.929  
AP  
Air-post  
0.168  
0.093  
AS  
Air-Span  
47.996  
0.827  
47.996  
0.827  
BV  
Back-via  
FP  
Final Passivation  
Saw Street  
0.865  
0.865  
ST  
NOTE: Unused layer numbers are reserved for future use.  
0.108  
0.108  
0.108  
0.108  
0.148  
0.148  
GMAX - 900um FET  
0.148  
0.148  
Specifications Subject to Change Without Notice.  
2
M/A-COM Inc.  
North America: Tel. (800) 366-2266  
Fax (800) 618-8883  
Asia/Pacific: Tel. +81 3 3263-8761  
Fax +81 3 3263-8769  
Europe:  
Tel. +44 (1344) 869-595  
Fax +44 (1344) 300-020  

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